Magnetron Sputtering MoN/CrMoN Multilayer Film Research on Improving the Performance of Milling Cutter
碩士 === 龍華科技大學 === 機械工程系碩士班 === 107 === In this study, a nitride multilayer film (substrate/MoN buffer layer/CrMoN) was deposited by DC reactive co-sputtering (DCMS). Chromium and molybdenum are used as targets, Ar is a plasma gas, N2 is a reaction gas, and the substrate includes soda glass, stainles...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2019
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Online Access: | http://ndltd.ncl.edu.tw/handle/x8n5p9 |