Magnetron Sputtering MoN/CrMoN Multilayer Film Research on Improving the Performance of Milling Cutter

碩士 === 龍華科技大學 === 機械工程系碩士班 === 107 === In this study, a nitride multilayer film (substrate/MoN buffer layer/CrMoN) was deposited by DC reactive co-sputtering (DCMS). Chromium and molybdenum are used as targets, Ar is a plasma gas, N2 is a reaction gas, and the substrate includes soda glass, stainles...

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Bibliographic Details
Main Authors: Wu, Qi-Xuan, 吳奇軒
Other Authors: Hsu, Chun-Yao
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/x8n5p9