Characterizations and Applications of p-type Oxide and Nitride Thin films deposited by High Power Impulse Magnetron Sputtering

碩士 === 明志科技大學 === 材料工程系碩士班 === 107 === Rapidly growing applications of p-oxide and nitride thin films in many disciplines have motivated us to study p-type oxide and nitride films which were deposited on glass and silicon substrates by high power impulse magnetron sputtering (HiPIMS) from a metallic...

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Bibliographic Details
Main Authors: SHIKHA SAKALLEY, 莎西卡
Other Authors: CHEN, SHENG-CHI
Format: Others
Language:en_US
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/qsj6xq