Characterizations of conductive copper nitride films deposited by high power impulse magnetron sputtering and it's application
碩士 === 明志科技大學 === 材料工程系碩士班 === 107 === In this study, we use high power pulsed magnetron sputtering to deposit copper nitride films. Initially, the Copper target power was kept constant at 300 W and changed the N2 flow rate from 10% to 80%, and further comparing its deposition at higher (20 mtorr) a...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/68btfg |