Influence of intrinsic layer engineering on HIT solar cells
碩士 === 國立中興大學 === 電機工程學系所 === 107 === This paper uses plasma-enhanced chemical vapor deposition (PECVD) to adjust the hydrogen dilution ratio RH (H2/SiH4), process pressure (P), RF power (Prf) and pulse-wave conditions (ton/toff) to fabricate intrinsic hydrogenated amorphous silicon film (i-a-Si:H)...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/cgi-bin/gs32/gsweb.cgi/login?o=dnclcdr&s=id=%22107NCHU5441091%22.&searchmode=basic |