The Study to Explore the Leakage Current and Time Dependent Dielectric Breakdown of Graphene as Dielectric Barriers of Copper Interconnects

碩士 === 國立成功大學 === 機械工程學系 === 107

Bibliographic Details
Main Authors: Han-CheCheng, 鄭翰哲
Other Authors: Jen-Fin Lin
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/89j2vs