High Sn Concentration GeSn MOSCAP and MOSFET Fabricated by Low Temperature Atomic Layer Deposition Process

碩士 === 國立暨南國際大學 === 電機工程學系 === 107 === In this work, we study on GeSn channel junctionless transistor. A high Sn concentration GeSn MOSCAP and junctionless FinFET were designed and fabricated. Unlike the traditional MOSFETs, the junctionless-FET depicts the same doping concentration on the source,...

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Bibliographic Details
Main Authors: TSAI, XIN-RU, 蔡昕儒
Other Authors: Chen, Jiann-Heng
Format: Others
Language:zh-TW
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/r8kvpm