UV-assisted thermal annealing of Low-k Carbon-Bridged Silicon Carbonitride Films
博士 === 國立交通大學 === 材料科學與工程學系所 === 107 === C-rich SiCxNy films are fabricated using radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) of single-precursor, silazanes, for use as low-k diffusion barrier and etch-stop layer for reducing the effective k (keff) of intra-metal dielectri...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/9q6wcg |