PEALD Silicon Carbonitride Films using a Silazane Precursor and Its Resistive Switching Behavior
碩士 === 國立交通大學 === 材料科學與工程學系所 === 107 === Plasma-enhanced chemical vapor deposited (PECVD) N-rich silicon carbonitride (SiCxNy) thin-films have been demonstrated as a promising candidate for resistive random-access memory (ReRAM) candidate owing to the conductive bridge random access memory (CBRAM)....
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/kuptda |