Study on the Resistive Switching Characteristics of HfOx-Based Resistive Random Access Memory (RRAM) Devices

碩士 === 國立交通大學 === 電子研究所 === 107 === Non-volatile, high switching speed, low operation voltages and simple structure were the advantages of resistive random access memory (RRAM) for high competitiveness in the field of memory technology. Recently, RRAM had attracted great attention and be supposed to...

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Bibliographic Details
Main Authors: Zhang, He-Xin, 張鶴馨
Other Authors: Cheng, Huang-Chung
Format: Others
Language:en_US
Published: 2018
Online Access:http://ndltd.ncl.edu.tw/handle/b4eywy