Study on the p-channel Polycrystalline-Germanium Thin-Film Transistors with Light Counter Doping and High-k Al2O3 Gate Dielectric via Continuous Wave Laser Crystallization
碩士 === 國立交通大學 === 電子研究所 === 107 === The monolithic stacking technology was widely investigated for the three-dimensional integrated circuits (3-D ICs) because of the best alignment precision between the device levels and thus the highest packing density. Nevertheless, the major challenge for the mon...
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| Format: | Others |
| Language: | en_US |
| Published: |
2018
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55ny3u |