Numerical analysis in the Planarization 10nm of 300mm Silicon wafer Epitaxial process
碩士 === 國立中央大學 === 能源工程研究所 === 107 === Chemical vapor deposition is a common method in semiconductor thin film growth processes. The flatness is improved for 12-inch epitaxial wafers required for semiconductor processes below 10 nm. The key technologies are: 1. Ultra-uniform epitaxial film 2. The waf...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/g5gtw2 |