Formation of the High-hardness Anti-reflective Coatings by High-power Impulse Magnetron Sputtering
碩士 === 國立中央大學 === 光電科學與工程學系 === 107 === High power impulse magnetron sputtering, a new generation coating technology, is characterized for the high peak power up to kW/cm^2 by modulating on/off time of the pulse power controller. The plasma density near the sputtering target can be greatly increased...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/6u82t5 |