The Studies on Deposit Formation Derived from Hexachlorodisilane in Atomic Layer Deposition Process Exhaust
碩士 === 國立高雄科技大學 === 環境與安全衛生工程系 === 107 === Atomic Layer Deposition(ALD) is a new generation semiconductor manufacturing technology. ALD offers better deposition quality over traditional chemical vapor deposition methods and has been widely used. Hexachlorodisilane (HCDS, Si2Cl6) has a lower depositi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/nqgx75 |