Effect of the Sputtering Processes and Annealing Temperatures on the Characteristics of Titanium Dioxide Film Using Thermal Oxidation.
碩士 === 國立屏東大學 === 應用物理系碩士班 === 107 === In this study, the titanium oxide thin films were deposited by HiPIMS reactive sputtering, which were processed by thermal oxidation. The as-deposited and thermal oxidation treatment film were analyzed. We chose the best sputtering parameter for the first lay...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/8yz4zj |