Effects of Target Stoichiometry on the Magnetron Sputtering Deposition of Copper Oxide Thin Films
碩士 === 國立中山大學 === 物理學系研究所 === 107 === While many studies have used pure copper targets to grow copper oxide thin film by reactive sputtering, the deposition rate has been found to be very high, ranging from 13-151 nm/minute, making thickness control a formidable task. The purpose of this study is...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/87zxa8 |