Edge Contacts in Nickel/Graphene Field Effect Transistors

碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 107 === Nowadays, the size of transistors is smaller and smaller for demands of higher chip performance and lower power consumption. However, when transistors were fabricated into nanoscale, a lot of problems arise. Such as Drain Induced Barrier Lower (DIBL), mobili...

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Bibliographic Details
Main Authors: Yen-Shang Wang, 王彥上
Other Authors: Chun-Wei Chen
Format: Others
Language:en_US
Published: 2019
Online Access:http://ndltd.ncl.edu.tw/handle/swynfy