Study on the Specific Contact Resistivity of the Composite Metal-VOx Interface Evaluated by Using CTLM method
碩士 === 國立虎尾科技大學 === 電子工程系碩士班 === 107 === To study three metals of vanadium, aluminum and germanium as the interface characteristic materials of vanadium oxide. In this study, the silicon nitride deposited on top of the silicon substrate by RF sputtering machine, and the second layer was the vanadium...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/4qtvk4 |