Improving of the Electron Field Emission Characteristics of Carbon Nanowalls by Plasma Treatment

碩士 === 大同大學 === 電機工程學系(所) === 107 === In this study, we use the radio frequency (RF) magnetron sputtering system to deposit the carbon nanowalls (CNWs) on the Si substrates. Firstly, we chang the RF power and gas flow ratio to find the optimal deposition conditions of the CNWs. Secondly, we use the...

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Bibliographic Details
Main Authors: Hung-Yi Lin, 林泓逸
Other Authors: Wen-Ching Shih
Format: Others
Published: 2019
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