Electron field emission application for growing diamond films by microwave plasma chemical vapor deposition
碩士 === 大同大學 === 電機工程學系(所) === 107 === In this study, we use the microwave plasma chemical vapor deposition system to grow the ultra-nanocrystalline diamond (UNCD) films. We change the gas flow rate and ratio,working,pressure,deposition time and metal substrate holder to investigate the effect of dep...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/x49fk5 |