Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process
碩士 === 國立虎尾科技大學 === 材料科學與工程系材料科學與綠色能源工程碩士在職專班 === 108 === Wafer cleaning is a very important process for wafer quality, which has a significant impact on the quality of silicon wafers, such as LPD (Light Point defect), MCL (Metal Contamination Level), etc. Different cleaning chemicals and cleaning c...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2019
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| Online Access: | http://ndltd.ncl.edu.tw/handle/4hy5bc |