Stoichiometry control mechanisms of bias sputtered zinc oxide films
This thesis reports the first detailed study of the stoichiometry control mechanisms and physical properties of ZnO films deposited by dc planar magnetron sputtering of a Zn target in a reactive Ar/0₂ atmosphere. Control of film stoichiometry was achieved using a subsidiary rf discharge at the subst...
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| Language: | English |
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University of British Columbia
2010
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| Online Access: | http://hdl.handle.net/2429/25579 |