Photonic device design flow : from mask layout to device measurement
Mask layout design is an important part in silicon photonic device design flow; the space used and the quality of the mask directly affect the cost of fabrication and quality of the outcome. To effectively minimize time spent on drawing masks, fixing design violations, and reducing unused spacings b...
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| Language: | English |
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University of British Columbia
2012
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| Online Access: | http://hdl.handle.net/2429/43510 |