Analysis of trace impurities in semiconductor-grade metal alkyl compounds by inductively -coupled plasma spectrometry
Group III Metal alkyl compounds, such as trimethylindium (TMI), trimethylaluminum (TMA), and trimethylgallium (TMG) are used in metal organic chemical vapor deposition (MOCVD) process to grow semiconductor layers. The analysis of these metal alkyls that are used for growing semiconductor layers is i...
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| Language: | ENG |
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ScholarWorks@UMass Amherst
2000
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| Online Access: | https://scholarworks.umass.edu/dissertations/AAI9978504 |