Theoretical analysis of current-induced void dynamics in metallic thin films
This thesis addresses electromigration-induced void dynamics in metallic thin films. This has been a problem of major interest both in terms of fundamental understanding of driven mass transport and microstructural evolution in solids and for addressing important interconnect reliability concerns in...
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| Language: | ENG |
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ScholarWorks@UMass Amherst
2007
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| Online Access: | https://scholarworks.umass.edu/dissertations/AAI3289212 |