Supercritical fluid deposition of thin metal films: Kinetics, mechanics and applications
In order to meet the demands of the continuous scaling of electronic devices, new technologies have been developed over the years. As we approach the newest levels of miniaturization, current technologies, such as physical vapor deposition and chemical vapor deposition, are reaching a limitation in...
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| Language: | ENG |
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ScholarWorks@UMass Amherst
2008
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| Online Access: | https://scholarworks.umass.edu/dissertations/AAI3359900 |