High resolution imprinting for microelectronics and photovoltaics
Nanoimprint lithography (NIL) has established itself as a competitive, high resolution and cost efficient alternative to standard photolithographic technologies. In the pursuit of the use of NIL in microelectronic and energy applications, such as fabrication of interlayer dielectrics and hybrid sola...
| Main Author: | |
|---|---|
| Language: | ENG |
| Published: |
ScholarWorks@UMass Amherst
2011
|
| Subjects: | |
| Online Access: | https://scholarworks.umass.edu/dissertations/AAI3482617 |