Laser-Plasma Sources for Extreme-Ultraviolet Lithography
This thesis describes the development and characterizationof a liquidxenon- jet laser-plasma source forextreme-ultraviolet (EUV) radiation. It is shown how thissource may be suitable for production-scale EUV lithography(EUVL). EUVL is one of the main candidates to succeeddeep-ultraviolet (DUV) litho...
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| Format: | Doctoral Thesis |
| Language: | English |
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KTH, Fysik
2003
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| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-3677 http://nbn-resolving.de/urn:isbn:91-7283-658-X |