HiPIMS-based Novel Deposition Processes for Thin Films
In this research, high power impulse magnetron sputtering (HiPIMS) based new deposition processes are introduced to address; the issue of low degree of ionization of C in magnetron sputtering discharges, and the difficulty encountered in thin film deposition on complex-shaped surfaces. The issue of...
| Main Author: | |
|---|---|
| Format: | Others |
| Language: | English |
| Published: |
Linköpings universitet, Plasma och beläggningsfysik
2012
|
| Subjects: | |
| Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-78728 http://nbn-resolving.de/urn:isbn:978-91-7519-870-5 |