Me-Si-C (Me= Nb, Ti or Zr) : Nanocomposite and Amorphous Thin Films
This thesis investigates thin films of the transition metal carbide systems Ti-Si-C, Nb-Si-C, and Zr-Si-C, deposited at a low substrate temperature (350 °C) with dc magnetron sputtering in an Ar discharge. Both the electrical and mechanical properties of these systems are highly affected by their st...
Main Author: | Tengstrand, Olof |
---|---|
Format: | Others |
Language: | English |
Published: |
Linköpings universitet, Tunnfilmsfysik
2012
|
Subjects: | |
Online Access: | http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-85830 http://nbn-resolving.de/urn:isbn:978-91-7519-730-2 |
Similar Items
-
Growth and Characterization of Amorphous TiAlSiN and HfAlSiN Thin Films
by: Fager, Hanna
Published: (2012) -
Cathodic Arc Synthesis of Ti-Si-C-N Thin Films from Ternary Cathodes
by: Eriksson, Anders
Published: (2010) -
Transition metal carbide nanocomposite and amorphous thin films
by: Tengstrand, Olof
Published: (2014) -
Thick and Thin Ti2AlC Coatings
by: Frodelius, Jenny
Published: (2010) -
Growth and Phase Stability Studies of Epitaxial Sc-Al-N and Ti-Al-N Thin Films
by: Höglund, Carina
Published: (2010)