Atomic Layer Deposition of Copper, Copper(I) Oxide and Copper(I) Nitride on Oxide Substrates

Atomic Layer Deposition of Copper, Copper(I) Oxide and Copper(I) Nitride on Oxide Substrates

Thin films play an important role in science and technology today. By combining different materials, properties for specific applications can be optimised. In this thesis growth of copper, copper(I) oxide and copper(I) nitride on two different substrates, amorphous SiO2 and single crystalline α-Al2O...

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Bibliographic Details
Main Author: Törndahl, Tobias
Format: Doctoral Thesis
Language:English
Published: Uppsala universitet, Institutionen för materialkemi 2004
Subjects:
Inorganic chemistry
Atomic Layer Deposition
ALD
copper
copper(I) oxide
copper(I) nitride
deposition pathway
CuCl
Cu(hfac)2
oxide substrates
epitaxy
DFT
ab-initio
Oorganisk kemi
Online Access:http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-4651
http://nbn-resolving.de/urn:isbn:91-554-6081-X

Internet

http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-4651
http://nbn-resolving.de/urn:isbn:91-554-6081-X

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