Surface Science Studies of Metal Oxides Formed by Chemical Vapour Deposition on Silicon

Surface Science Studies of Metal Oxides Formed by Chemical Vapour Deposition on Silicon

For an electronic device well-designed interfaces are critical for the performance. Studies of interfaces down to an atomic level are thus highly motivated both from a fundamental and technological point of view. In this thesis, a surface science approach has been employed to study the formation of...

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Bibliographic Details
Main Author: Karlsson, Patrik
Format: Doctoral Thesis
Language:English
Published: Uppsala universitet, Fysik I 2006
Subjects:
Physics
chemical vapour deposition
high-k
metal oxides
silicon
dye-solid interface
metal organic
electron spectroscopy
scanning tunnelling microscopy
Fysik
Online Access:http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-7088
http://nbn-resolving.de/urn:isbn:91-554-6622-2

Internet

http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-7088
http://nbn-resolving.de/urn:isbn:91-554-6622-2

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