Chemical vapor deposition of diamond thin films on titanium silicon carbide
Chemical vapor deposition (CVD) has been the main method for synthesizing diamond thin films on hetero substrate materials since 1980s. It has been well acknowledged that both nucleation and growth of diamond on non-diamond surfaces without pre-treatment are very difficult and slow. Furthermore, the...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en |
| Published: |
University of Saskatchewan
2009
|
| Subjects: | |
| Online Access: | http://library.usask.ca/theses/available/etd-09152009-072632/ |