Reliability Analysis of Hafnium Oxide Dielectric Based Nanoelectronics
With the physical dimensions ever scaling down, the increasing level of sophistication in nano-electronics requires a comprehensive and multidisciplinary reliability investigation. A kind of nano-devices, HfO2-based high-k dielectric films, are studied in the statistical aspect of reliability as wel...
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Trace: Tennessee Research and Creative Exchange
2008
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| Online Access: | http://trace.tennessee.edu/utk_graddiss/534 |