Design and synthesis of materials for 157 nm photoresists applications

Design and synthesis of materials for 157 nm photoresists applications

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Bibliographic Details
Main Author: Pinnow, Matthew James
Format: Others
Language:English
Published: 2008
Subjects:
Photoresists > Materials
Photolithography
Online Access:http://hdl.handle.net/2152/1689

Internet

http://hdl.handle.net/2152/1689

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