Cold wall reactor for ultra-high vacuum high temperature chemical vapor deposition
Chemical vapor deposition is a process that enables the deposition of thin films material with a high degree of thickness control, composition and film quality. In an ultra-high vacuum environment (UHV), films of high purity and controlled crystal structure can be achieved. The control of the crysta...
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| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://hdl.handle.net/2152/21675 |