Layout optimization with dummy features for chemical-mechanical polishing manufacturability

Layout optimization with dummy features for chemical-mechanical polishing manufacturability

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Bibliographic Details
Main Author: Tian, Ruiqi
Format: Others
Language:English
Published: 2008
Subjects:
Grinding and polishing
Integrated circuits > Very large scale integration > Design and construction
Online Access:http://hdl.handle.net/2152/994

Internet

http://hdl.handle.net/2152/994

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