Development of virtual metrology in semiconductor manufacturing
Virtual Metrology (VM) predicts end-of-batch properties (metrology data) from measurable input data composed of pre-process metrology and fault detection and classi cation (FDC) system outputs. This dissertation aims at moving a step closer to the realization of VM in semiconductor manufacturing by...
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| Format: | Others |
| Language: | English |
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2011
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| Online Access: | http://hdl.handle.net/2152/ETD-UT-2011-08-4079 |