Solvent annealing and thickness control for the orientation of silicon-containing block copolymers for nanolithographic applications
Block copolymers are an ideal solution for a wide variety of nanolithographic opportunities due to their tendency to self-assemble on nanoscopic length scales. High etch selectivity and thin-film orientation are crucial to the success of this technology. Most conventional block copolymers have poor...
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| Format: | Others |
| Language: | English |
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2012
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| Online Access: | http://hdl.handle.net/2152/ETD-UT-2012-05-5841 |