Deposition and characterization of HfO₂ thin films
Hafnium Dioxide(HfO₂) thin films were deposited on glass, metal, and silicon wafer substrates using magnetron RF reactive sputtering techniques. Structure and morphology of the thin films were investigated by x-ray diffraction (XRD), transmission electron microscopy (TEM) and scanning electron micro...
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| Format: | Others |
| Language: | en |
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Virginia Tech
2014
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| Online Access: | http://hdl.handle.net/10919/43688 http://scholar.lib.vt.edu/theses/available/etd-07112009-040501/ |