The Effect of Growth Method on GaN Films and Their Interfaces with CdTe and CdS

This work has analyzed the complex interfaces of GaN and InGaN grown by sputter deposition and GaN grown by metal-organic chemical vapor deposition (MOCVD) with CdTe and CdS. First, the GaN and InGaN films were characterized by AFM and XRD, and it has been shown that the MOCVD samples have a very s...

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Bibliographic Details
Main Author: Gouldey, David
Other Authors: Materials Science and Engineering
Format: Others
Language:en_US
Published: Virginia Tech 2017
Subjects:
GaN
Online Access:http://hdl.handle.net/10919/76913
http://scholar.lib.vt.edu/theses/available/etd-12152010-184526/