The adsorption of sulfur and halogen containing materials on nickel studied by X-ray photoelectron spectroscopy and thermal desorption spectroscopy
The chemical adsorption and reaction of methyl fluoride, methyl chloride, methyl bromide, methyl iodide, methyl sulfide, dimethyl sulfide, dimethyl disulfide, and bis(trifluoromethyl) disulfide on clean, polycrystalline nickel surface (at 25°C) were investigated using an X-ray photoelectron spectrom...
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| Format: | Others |
| Language: | en_US |
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Virginia Polytechnic Institute and State University
2017
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| Online Access: | http://hdl.handle.net/10919/81023 |