Nanofabrication Using Electron Beam Lithography: Novel Resist and Applications
This thesis addresses nanostructure fabrication techniques based on electron beam lithography, which is the most widely employed nanofabrication techniques for R&D and for the prototyping or production of photo-mask or imprint mold. The focus is on the study of novel resist and development proce...
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| Language: | en |
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2013
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| Online Access: | http://hdl.handle.net/10012/7859 |