Processing and characterization of RF sputtered alumina thin films.
Thin films of alumina were deposited on ferrite (NiₓZn₍₁₋ₓ₎Fe₂O₄), glass, single crystal silicon and graphite substrates by RF sputtering. Though standard, amorphous Al₂O₃ films are readily soluble in hot phosphoric acid, these sputtered films exhibited only reluctant etchability by the acid. Experi...
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| Language: | en |
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The University of Arizona.
1988
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| Online Access: | http://hdl.handle.net/10150/184611 |