Removal of Adsorbed Moisture and Organics from Surfaces and Nanostructures in Semiconductor Manufacturing
As the semiconductor industry is moving towards achieving smaller, denser and faster integrated circuits; the issue of contamination control is becoming increasingly important. The current work focuses on the mechanism and kinetics of removal of adsorbed moisture and organics from surfaces and nanos...
| Main Author: | |
|---|---|
| Other Authors: | |
| Language: | EN |
| Published: |
The University of Arizona.
2008
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10150/193597 |