Removal of Adsorbed Moisture and Organics from Surfaces and Nanostructures in Semiconductor Manufacturing
As the semiconductor industry is moving towards achieving smaller, denser and faster integrated circuits; the issue of contamination control is becoming increasingly important. The current work focuses on the mechanism and kinetics of removal of adsorbed moisture and organics from surfaces and nanos...
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Language: | EN |
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The University of Arizona.
2008
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Online Access: | http://hdl.handle.net/10150/193597 |