Applications of Raman Spectroscopy in Cu-CMP and in BEOL Cleaning Chemistries
In copper chemical mechanical planarization (CMP), in situ detection of barrier to dielectric layer transition is typically done using an optical reflectance technique. The introduction of carbon doped oxides (CDOs) as low-dielectric constant (k) materials for dielectric layers has opened up the pos...
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| Language: | EN |
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The University of Arizona.
2007
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| Online Access: | http://hdl.handle.net/10150/193710 |