Lowalekar, V. P., & Raghavan, S. (2006). Oxalic Acid Based Chemical Systems for Electrochemical Mechanical Planarization of Copper. The University of Arizona.
Chicago Style (17th ed.) CitationLowalekar, Viral Pradeep, and Srini Raghavan. Oxalic Acid Based Chemical Systems for Electrochemical Mechanical Planarization of Copper. The University of Arizona, 2006.
MLA (8th ed.) CitationLowalekar, Viral Pradeep, and Srini Raghavan. Oxalic Acid Based Chemical Systems for Electrochemical Mechanical Planarization of Copper. The University of Arizona, 2006.
Warning: These citations may not always be 100% accurate.