Nano-Particle Removal from Surface of Materials Used in EUV Mask Fabrication
With device scaling, the current optical lithography technique is reaching its technological limit to print small features. Extreme Ultra-Violet (EUV) lithography has shown promise to print extremely thin lines reliably and cost-effectively. Many challenges remain before introducing EUV to large sca...
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| Language: | EN |
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The University of Arizona.
2006
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| Online Access: | http://hdl.handle.net/10150/194270 |