Metrology and Characterization of Impurity Transport During Cleaning of Micro and Nano Structures
A major challenge in the manufacturing of micro and nano devices is the cleaning, rinsing, and drying of very small structures. Without a technology for in situ and real-time monitoring and controlling, the rinse processes that account for a significant fraction of the total processing steps use a l...
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| Language: | EN |
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The University of Arizona.
2006
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| Online Access: | http://hdl.handle.net/10150/195231 |