IN-SITU ELECTRO-CHEMICAL RESIDUE SENSOR AND PROCESS MODEL APPLICATION IN RINSING AND DRYING OF NANO-STRUCTURES
Typical surface preparation consists of exposure to cleaning chemical to remove contaminants followed by rinsing with ultra-pure water which is followed by drying. Large quantities of water, various chemicals, and energy are used during rinsing and drying processes. Currently there is no in-situ m...
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| Language: | EN |
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The University of Arizona.
2010
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| Online Access: | http://hdl.handle.net/10150/195656 |