CONTROL OF CAVITATION USING DISSOLVED CARBON DIOXIDE FOR DAMAGE-FREE MEGASONIC CLEANING OF WAFERS

CONTROL OF CAVITATION USING DISSOLVED CARBON DIOXIDE FOR DAMAGE-FREE MEGASONIC CLEANING OF WAFERS

This dissertation describes the finding that dissolved carbon dioxide is a potent inhibitor of sonoluminescence and describes the implications of the finding in the development of improved megasonic cleaning formulations. Megasonic cleaning, or the removal of contaminants particles from wafer surfac...

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Bibliographic Details
Main Author: Kumari, Sangita
Other Authors: Raghavan, Srini
Language:en
Published: The University of Arizona. 2011
Subjects:
Damage
Megasonic
Semiconductor
Wafer
Materials Science & Engineering
Carbon Dioxide
Cleaning
Online Access:http://hdl.handle.net/10150/205449

Internet

http://hdl.handle.net/10150/205449

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